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Tel: 17734809689
Tel: 86-371-86259723
Tel: 17734809689
Tel: 17734809689
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Tel: +86-371- 86259723
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CAS NO.40949-94-8
1(10-100)Metric Ton1(10-100)Metric Ton
Potassium bis(trimethylsilyl)amide Basic information |
Product Name: | Potassium bis(trimethylsilyl)amide |
Synonyms: | HexamethyldisilazanePotassiumSalt(15%inToluene);potassiumhexamethyldisilazane(solutioninthf);potassiumhexamethyldisilazane,khmds,in;potassiumhexamethyldisilazane,khmds,intetrahydrofuran;potassiumhexamethyldisilazane,khmds,intoluene;1,1,1,3,3,3-HEXAMETHYLDISILAZANE POTASSIUM SALT;KHMDS;HEXAMETHYLDISILAZANE POTASSIUM SALT |
CAS: | 40949-94-8 |
MF: | C6H18KNSi2 |
MW: | 199.48 |
EINECS: | 424-100-2 |
Product Categories: | Aliphatics;Analytical Chemistry;GC Derivatizing Reagents;Si (Classes of Silicon Compounds);Silazanes;Silylation (GC Derivatizing Reagents);Si-N Compounds;Trimethylsilylation (GC Derivatizing Reagents);Classes of Metal Compounds;K (Potassium) Compounds (excluding simple potassium salts);Silicon Compounds (for Synthesis);Synthetic Organic Chemistry;Typical Metal Compounds;25mL Sure/Seal Reagents;Chemical Synthesis;Organic Bases;Organometallic Reagents;Synthetic Reagents |
Mol File: | 40949-94-8.mol |
Potassium bis(trimethylsilyl)amide Chemical Properties |
bp | 111 °C |
density | 0.877 g/mL at 25 °C |
vapor density | 3.2 (vs air) |
vapor pressure | 54 mm Hg ( 25 °C) |
refractive index | 1.4920 |
Fp | 45 °F |
storage temp. | Refrigerator |
Sensitive | Moisture Sensitive |
BRN | 4006754 |
CAS DataBase Reference | 40949-94-8(CAS DataBase Reference) |
Safety Information |
Hazard Codes | C,F,Xn |
Risk Statements | 14-34-67-65-63-48/20-11-40-36/37/38-19-37 |
Safety Statements | 26-36/37/39-45-62-43-46-16-36/37 |
RIDADR | UN 3263 8/PG 3 |
WGK Germany | 3 |
F | 1-3-10 |
TSCA | No |
HazardClass | 3 |
PackingGroup | II |
MSDS Information |
Provider | Language |
---|---|
ACROS | English |
SigmaAldrich | English |
ALFA | English |
Potassium bis(trimethylsilyl)amide Usage And Synthesis |
Chemical Properties | Colorless to amber solution |
Usage | Strong base used in the alkylation carbonyl compounds.1 |
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